AX-7670-0190-47768-AMAT-HDP-CVD 反应控制系统 确保了高精度和可靠性

产品介绍

RPS MKS AX-76700190-47768 AMAT HDP CNVD RKS是一款高品质的反应控制系统，适用于化学气相沉积反应中的流量控制和压力控制。该系统采用先进的技术，确保了高精度和可靠性。

技术说明

RPSMKS AX-76700190-47768 AMAT HDP CvOG无识别结果进的技术，包括数字信号处理、PID控制和高精度传感器。它可以实时监测和控制反应中的流量和压力，从而实现对反应过程的精确控制。

产品说明

RPS MKS AX-76700190-47768 AMAT HDPCVD RKS由高精度传感器、控制器和软件组成。该系统可以实现对反应过程中多种气体的流量和压力控制，并提供实时数据记录和远程监控功能。

产品参数

·流量范围:0~1000sccm

·压力范围:0~1000Torr

·精度:±0.5%

ASTRON反应气体发生器专为提高流动能力和工艺而设计的灵活性。ASTRONi反应气体发生器消除了对氩气的需求加工，允许选择点火气体兼容现有的工艺气体，和增加整体流程，减少处理时间，提高吞吐量。

基于专利的低场环形等离子体技术，ASTRONi反应气体发电机提供更广泛的工作压力范围，同时保持高输入气体解离速率。高可靠性，经过现场验证的设计架构结合了功能信号源，控制模块和等离子体室。结果是一个紧凑的，可安装在盖子上的装置，这很容易积分。

ASTRONi反应气体发生器的主要应用是作为远程源反应气体用于清除CVD或FPD工艺室内壁上不需要的沉积物需要更大流程灵活性的地方。通过产生氟原子与废物沉积在腔内，形成新的气体，很容易擦洗，以尽量减少环境影响。此外，远程源减少了磨损与原位射频方法相比。

AX-7670-0190-47768-AMAT-HDP-CVD 反应控制系统 确保了高精度和可靠性

Product introduction

RPS MKS AX-76700190-47768 AMAT HDP CNVD RKS is a high quality reaction control system for flow control and pressure control in chemical vapor deposition reactions. The system uses advanced technology to ensure high precision and reliability.

Technical specification

RPSMKS AX-76700190-47768 AMAT HDP CvOG technology without recognition results, including digital signal processing, PID control and high-precision sensors. It can monitor and control the flow and pressure in the reaction in real time, so as to achieve accurate control of the reaction process.

Product description

RPS MKS AX-76700190-47768 AMAT HDPCVD RKS consists of high-precision sensors, controllers and software. The system can realize the flow and pressure control of various gases in the reaction process, and provide real-time data recording and remote monitoring functions.

Product parameter

· Flow range :0~1000sccm

· Pressure range :0~1000Torr

· Accuracy :±0.5%

ASTRON Reaction gas generators are designed for increased flow capacity and process flexibility. The ASTRONi reaction gas generator eliminates the need for argon processing, allows the selection of ignition gases compatible with existing process gases, and increases the overall process, reducing processing time and improving throughput.

Based on patented low-field torus plasma technology, the ASTRONi reactive gas generator offers a wider operating pressure range while maintaining a high input gas dissociation rate. Highly reliable, field-proven design architecture combines a functional signal source, control module and plasma chamber. The result is a compact, lid-mountable device, which is easy to integrate.

The main application of the ASTRONi reaction gas generator is as a remote source reaction gas for removing unwanted deposits from the walls of CVD or FPD process chambers where greater process flexibility is required. By producing fluorine atoms with waste deposited in the cavity, new gases are formed that are easily scrubbed to minimize environmental impact. In addition, the remote source reduces wear compared to in situ RF methods.